Anti-reflection coating and optical member comprising same

ABSTRACT

An anti-reflection coating having an three-layer structure comprising first to third layers formed in this order on a substrate, the substrate having a refractive index of 1.6-1.9, the first layer having a refractive index of 1.37-1.57, the second layer having a refractive index of 1.75-2.5, and the third layer having a refractive index of 1.18-1.32, to light in a wavelength range of 550 nm; the third layer being formed by silica aerogel; and the first and second layers containing no Al 2 O 3 .

The present application is a divisional of U.S. patent application Ser.No. 14/453,193 filed on Aug. 6, 2014—the disclosure of which isincorporated herein by reference in its entirety—which claims priorityfrom Japanese Patent Application No. 2013-241422 filed on Nov. 22, 2013,and from Japanese Patent Application No. 2013-173437 filed on Aug. 23,2013.

FIELD OF THE INVENTION

The present invention relates to an anti-reflection coating having athree- or four-layer structure containing no Al₂O₃, and an opticalmember comprising the anti-reflection coating.

BACKGROUND OF THE INVENTION

A high-performance, single-focus or zoom lens unit for photographcameras, broadcasting cameras, etc. generally has about 5-40 lenses in alens barrel. There are also wide-angle lenses for wide image, which havelarge incident angles of light beams in peripheral portions. Also, alens having a small radius of curvature to its effective diameter issometimes disposed in a light path for optical design. Formed on opticalmembers such as these lenses are multi-layer, anti-reflection coatingscomprising a combination of dielectric films having different refractiveindices for utilizing interference effects with dielectric filmthickness of ½λ or ¼λ to a center wavelength λ.

JP 2009-193029 A discloses an anti-reflection coating comprising a firstlayer of alumina having an optical thickness of 97.0-181.0 nm, a secondlayer having an optical thickness of 124.0-168.5 nm and a refractiveindex of 1.33-1.50, which is made of at least one selected from MgF₂,SiO₂ and Al₂O₃, and a third layer of porous silica having an opticalthickness of 112.5-169.5 nm formed in this order on a substrate having arefractive index of 1.60-1.93 to light in a wavelength range of 400-700nm, the first and second layers being formed by a vacuum vapordeposition method, and the third layer being formed by a sol-gel method.JP 2009-193029 A describes that this anti-reflection coating hasexcellent anti-reflection characteristics, with alumina used in thefirst layer preventing the weathering of the substrate surface.

The anti-reflection coating described in JP 2009-193029 A comprises aporous silica layer having a refractive index of 1.07-1.18 as the thirdlayer, as is clear from Examples. However, it is difficult to stablyproduce a porous silica layer having extremely high porosity for such alow refractive index. When the porous silica layer has a refractiveindex of more than 1.18, an optimum anti-reflection coating cannot beobtained by the structure described in JP 2009-193029 A.

JP 2009-210733 A discloses an anti-reflection coating comprising a firstlayer of alumina having an optical thickness of 25.0-250.0 nm, a secondlayer having an optical thickness of 100.0-145.0 nm and a refractiveindex of 1.40-1.50, which is made of at least one selected from MgF₂,SiO₂ and Al₂O₃, and a third layer of porous silica having an opticalthickness of 100.0-140.0 nm formed in this order on a substrate having arefractive index of 1.53 or more and less than 1.60 to light in awavelength range of 400-700 nm, the first and second layers being formedby a vacuum vapor deposition method, and the third layer being formed bya sol-gel method. JP 2009-210733 A describes that this anti-reflectioncoating has excellent anti-reflection characteristics, with alumina usedin the first layer preventing the weathering of the substrate surface.However, because this anti-reflection coating fails to exhibit optimumanti-reflection performance when formed on a substrate having arefractive index of 1.60 or more, further improvement is desired.

JP 10-319209 A discloses a method for producing an anti-reflectioncoating on a substrate, which comprises the steps of forming a firstanti-reflection layer of a first material by a wet or dry process, andforming a second anti-reflection layer of a second material on the firstanti-reflection layer by a wet process. It describes that one or moreanti-reflection layers may be additionally formed under the firstanti-reflection layer by a wet or dry process, the dry process beingselected from vacuum vapor deposition, sputtering and CVD, and the wetprocess comprises a sol-gel process. It further describes that suchmethod provides an anti-reflection coating having high performance suchas low reflectance, and wide wavelength and angle ranges ofanti-reflection, particularly in an ultraviolet range, with a smallnumber of layers.

JP 10-319209 A discloses an anti-reflection coating having two-layerstructure comprising a first layer of SiO₂ (dry process) and a secondlayer of porous SiO₂ (sol-gel method), and an anti-reflection coatinghaving a three-layer structure comprising a first layer of LaF₃, NdF₃ orGdF₃ (dry process), a second layer of SiO₂ (wet or dry process), and athird layer of porous SiO₂ (sol-gel method). However, because thisanti-reflection coating has insufficient weathering-preventing effects,further improvement is desired.

Further, when these anti-reflection coatings are formed on lenssubstrates having maximum inclination angles of 30° or more, theiranti-reflection performance is extremely poor in portions having largeinclination angles, failing to obtain sufficient anti-reflectioneffects. Accordingly, the development of anti-reflection coatingssuitable for lens surfaces having such large inclination angles isdesired.

JP 2012-18286 A discloses an optical member comprising ananti-reflection coating comprising first and second layers formed on asubstrate by a dry process, and a third layer of silica aerogel formedby a wet process, to light in a wavelength range of 550 nm, therefractive index of the substrate being higher than that of the firstlayer and 1.9 or less, the refractive index A of the third layer beingin a range of 1.18-1.32, the first to third layers having refractiveindices decreasing in this order from the first layer, and the opticalthickness Y of the second layer meeting the conditions of−750A+945≤Y≤−750A+1020, and 20≤Y≤120. JP 2012-18286 A further describesthat to have high adhesion, and to prevent the weathering of opticalglass substrate surfaces, a material forming the first layer ispreferably Al₂O₃. It has been found, however, that when this opticalmember is stored under high-temperature, high-humidity conditions for along period of time, the anti-reflection coating suffers fogging,resulting in deteriorated spectral reflection characteristics.

OBJECTS OF THE INVENTION

Accordingly, the first object of the present invention is to provide ananti-reflection coating having high anti-reflection performance, withexcellent storage stability for a long period of time.

The second object of the present invention is to provide an inexpensiveoptical member comprising an anti-reflection coating, whoseanti-reflection performance is not poor even in a peripheral portion ofa lens having a small radius of curvature to its effective diameter(having a large surface inclination angle).

DISCLOSURE OF THE INVENTION

As a result of intensive research in view of the above objects, theinventors have found that (1) in the optical member described in JP2012-18286 A, the cause of fogging generated when it is stored underhigh-temperature, high-humidity conditions for a long period of time isa reaction of Al₂O₃ forming the first layer with materials used for thethird layer (silica aerogel coating solution and alkali treatmentsolution), and that (2) excellent anti-reflection characteristics withno fogging which would occur when stored under high-temperature,high-humidity conditions for a long period of time are obtained withoutusing an Al₂O₃ layer, when (a) in a three-layer, anti-reflection coatinghaving an uppermost silica aerogel layer, the refractive index of thesecond layer is set higher than those of the first and third layers, orwhen (b) in a four-layer, anti-reflection coating having an uppermostsilica aerogel layer, the refractive indices of the first to thirdlayers are adjusted. The present invention has been completed based onsuch findings.

Thus, the first anti-reflection coating of the present invention has athree-layer structure comprising first to third layers formed in thisorder on a substrate,

-   -   the substrate having a refractive index of 1.6-1.9, the first        layer having a refractive index of 1.37-1.57, the second layer        having a refractive index of 1.75-2.5, and the third layer        having a refractive index of 1.18-1.32, to light in a wavelength        range of 550 nm;    -   the third layer being formed by silica aerogel; and    -   the first and second layers containing no Al₂O₃.

The first optical member of the present invention comprises the firstanti-reflection coating on a lens substrate, whose effective diameter Dand radius R of curvature meet the condition of 0.1≤D/R≤2.

In the first anti-reflection coating and the first optical member, thefirst and second layers are preferably formed by a dry process, thethird layer is preferably formed by a wet process, and the wet processpreferably includes a sol-gel method.

In the first optical member, the lens substrate preferably has themaximum inclination angle of 30-65°.

In the first optical member, the optical thickness D1(θ_(t)) of thefirst layer and the optical thickness D2(θ_(t)) of the second layer atan arbitrary inclination angle θ_(t) of the lens substrate arepreferably expressed by the following formulae (1) and (2):D1(θ_(t))=D1₀×(cos θ_(t))^(α)  (1), andD2(θ_(t))=D2₀×(cos θ_(t))^(β)  (2),wherein D1 ₀ and D2 ₀ represent the optical thickness of the first andsecond layers at a center of the lens substrate, and α and β are numbersindependently in a range of 0-1.

In the first optical member, the thickness of the third layer ispreferably constant regardless of the inclination angle of the lenssubstrate, or larger in a peripheral portion of the lens substrate thanat a center of the lens substrate.

The second anti-reflection coating of the present invention has afour-layer structure comprising first to fourth layers formed in thisorder on a substrate,

-   -   the substrate having a refractive index of 1.6-1.9, the first        layer having a refractive index of 1.37-1.57, the second layer        having a refractive index of 1.75-2.5, the third layer having a        refractive index of 1.37-1.57, and the fourth layer having a        refractive index of 1.18-1.32, to light in a wavelength range of        550 nm;    -   the fourth layer being formed by silica aerogel; and    -   the first to third layers containing no Al₂O₃.

The second optical member of the present invention comprises the secondanti-reflection coating on a lens substrate, whose effective diameter Dand radius R of curvature meet the condition of 0.1≤D/R≤2.

The third anti-reflection coating of the present invention has afour-layer structure comprising first to fourth layers formed in thisorder on a substrate,

-   -   the substrate having a refractive index of 1.6-1.9, the first        layer having a refractive index of 1.75-2.5, the second layer        having a refractive index of 1.37-1.57, the third layer having a        refractive index of 1.75-2.5, and the fourth layer having a        refractive index of 1.18-1.32, to light in a wavelength range of        550 nm;    -   the fourth layer being formed by silica aerogel; and    -   the first to third layers containing no Al₂O₃.

The third optical member of the present invention comprises the thirdanti-reflection coating on a lens substrate, whose effective diameter Dand radius R of curvature meet the condition of 0.1≤D/R≤2.

In the second and third anti-reflection coatings and the second andthird optical members, the first to third layers are preferably formedby a dry process, the fourth layer is preferably formed by a wetprocess, and the wet process preferably includes a sol-gel method.

In the second and third optical members, the lens substrate preferablyhas the maximum inclination angle of 30-65°.

In the second and third optical members, the optical thickness D1(θ_(t))of the first layer, the optical thickness D2(θ_(t)) of the second layerand the optical thickness D3(θ_(t)) of the third layer at an arbitraryinclination angle θ_(t) of the lens substrate are preferably expressedby the following formulae (1) to (3):D1(θ_(t))=D1₀×(cos θ_(t))^(α)  (1),D2(θ_(t))=D2₀×(cos θ_(t))^(β)  (2), andD3(θ_(t))=D3₀×(cos θ_(t))^(γ)  (3),wherein D1 ₀, D2 ₀ and D3 ₀ represent the optical thickness of the firstto third layers at a center of the lens substrate, and α, β and γ arenumbers independently in a range of 0-1.

In the second and third optical members, the thickness of the fourthlayer is preferably constant regardless of the inclination angle of thelens substrate, or larger in a peripheral portion of the lens substratethan at a center of the lens substrate.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic cross-sectional view showing one example of theoptical members of the present invention.

FIG. 2 is a schematic cross-sectional view showing another example ofthe optical members of the present invention.

FIG. 3 is a schematic cross-sectional view showing the substrateinclination angle of the optical member.

FIG. 4(a) is a schematic cross-sectional view showing the incident angleof light beams at a center point of the optical member.

FIG. 4(b) is a schematic cross-sectional view showing the incident angleof light beams at a point other than the center point of the opticalmember.

FIG. 5 is a schematic cross-sectional view showing the effectivediameter and radius of curvature of a lens in the optical member.

FIG. 6 is a schematic cross-sectional view showing a further example ofthe optical members of the present invention.

FIG. 7 is a schematic cross-sectional view showing a still furtherexample of the optical members of the present invention.

FIG. 8 is a graph showing the relation between spectral reflectance andthe incident angle of light beams in the optical member of Example 1.

FIG. 9 is a graph showing the relation between average reflectance ateach incident angle of light beams and a substrate inclination angle inthe optical member of Example 1.

FIG. 10 is a graph showing the relation between spectral reflectance andthe incident angle of light beams in the optical member of ComparativeExample 1.

FIG. 11 is a graph showing the relation between average reflectance ateach incident angle of light beams and a substrate inclination angle inthe optical member of Comparative Example 1.

FIG. 12 is a graph showing the relation between spectral reflectance andthe incident angle of light beams in the optical member of ComparativeExample 2.

FIG. 13 is a graph showing the relation between average reflectance ateach incident angle of light beams and a substrate inclination angle inthe optical member of Comparative Example 2.

FIG. 14 is a graph showing the relation between spectral reflectance andthe incident angle of light beams in the optical member of ComparativeExample 3.

FIG. 15 is a graph showing the relation between average reflectance ateach incident angle of light beams and a substrate inclination angle inthe optical member Comparative Example 3.

FIG. 16 is a graph showing the relation between spectral reflectance andthe incident angle of light beams in the optical member of Example 2.

FIG. 17 is a graph showing the relation between average reflectance ateach incident angle of light beams and a substrate inclination angle inthe optical member of Example 2.

FIG. 18 is a graph showing the relation between spectral reflectancebefore and after the accelerated environmental testing and a substrateinclination angle in the optical member of Example 1.

FIG. 19 is a graph showing the relation between spectral reflectancebefore and after the accelerated environmental testing and a substrateinclination angle in the optical member of Comparative Example 1.

FIG. 20 is a graph showing the relation between spectral reflectancebefore and after the accelerated environmental testing and a substrateinclination angle in the optical member of Example 2.

FIG. 21 is a schematic view showing one example of apparatuses forforming an anti-reflection coating by vacuum vapor deposition.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

The present disclosure relates to subject matter contained in JapanesePatent Application No. 2013-173437 filed on Aug. 23, 2013 and JapanesePatent Application No. 2013-241422 filed on Nov. 22, 2013, which areexpressly incorporated herein by reference in their entirety.

The present invention will be explained in detail below referring to theattached drawings. Explanations of each embodiment will be applicable toother embodiments unless otherwise mentioned. Please note that therefractive index of each layer in the anti-reflection coating isdetermined to light in a wavelength range of 550 nm, unless otherwisementioned, and that in the attached drawings, the thickness of eachlayer is exaggerated to make clear the layer structure of theanti-reflection coating.

[1] FIRST ANTI-REFLECTION COATING

(1) LAYER STRUCTURE

FIG. 1 shows an example of first anti-reflection coatings 3 having athree-layer structure comprising a first layer 3 a, a second layer 3 band a third layer 3 c formed in this order on the substrate 2. In thefirst anti-reflection coating 3, the first layer 3 a has a refractiveindex of 1.37-1.57, the second layer 3 b has a refractive index of1.75-2.5, and the third layer 3 c has a refractive index of 1.18-1.32.With such structure that the refractive index of the second layer islarger than those of the first and third layers, excellentanti-reflection performance can be obtained on a substrate 2 having arefractive index of 1.6-1.9, without using Al₂O₃ (refractive index:1.76).

The first layer is a layer containing no Al₂O₃. The refractive index ofthe first layer is 1.37-1.57, preferably 1.37-1.5, more preferably1.37-1.48, most preferably 1.37-1.41. Accordingly, the first layer ispreferably a MgF₂ layer. The optical thickness of the first layer ispreferably 25-100 nm, more preferably 30-80 nm. The refractive index ofthe second layer is 1.75-2.5, preferably 1.99-2.33, more preferably1.99-2.33. The optical thickness of the first layer at a substrateinclination angle of 0° is preferably 25-100 nm, more preferably 30-80nm. The first layer is preferably formed by a dry process.

The second layer is a layer containing no Al₂O₃. The refractive index ofthe second layer is 1.75-2.5, preferably 1.99-2.33, more preferably1.99-2.33, most preferably 1.99-2.3. Accordingly, the second layer ispreferably made of TaO₂+Y₂O₃+Pr₆O₁₁. The second layer made ofTaO₂+Y₂O₃+Pr₆O₁₁ has improved adhesion to the first and third layers.The optical thickness of the second layer at a substrate inclinationangle of 0° is preferably 10-50 nm, more preferably 20-45 nm. The secondlayer is also preferably formed by a dry process.

The third layer is a silica aerogel layer preferably formed by a wetprocess. The wet process preferably includes a sol-gel method. Therefractive index of the third layer is 1.18-1.32, preferably 1.18-1.30,more preferably 1.18-1.28. With the third layer having such a lowrefractive index, excellent anti-reflection effects can be obtained. Theoptical thickness of the third layer is preferably 90-140 nm, morepreferably 100-135 nm.

(2) SUBSTRATE

The first anti-reflection coating 3 can be formed on a substrate havinga refractive index of 1.6-1.9. The use of a substrate having such arefractive index provides an optical member having good anti-reflectionperformance in a wavelength range of visible light. Materials for thesubstrate may be optical glass such as BaSF2 (refractive index: 1.6684),SF5 (refractive index: 1.6771), LaF2 (refractive index: 1.7475), LaSF09(refractive index: 1.8197), LaSF01 (refractive index: 1.7897), LaSF016(refractive index: 1.7758), LAK7 (refractive index: 1.654), LAK14(refractive index: 1.6995), etc. The substrate may be in a plate or lensshape.

(3) ANTI-REFLECTION CHARACTERISTICS

The first anti-reflection coating having a three-layer structurecomprising an uppermost layer of silica aerogel, with a higherrefractive index in the second layer than in the first and third layers,has excellent anti-reflection characteristics in wide ranges ofwavelength and angle without using an Al₂O₃ layer, free from foggingwhich would occur in conventional anti-reflection coatings comprising asilica aerogel layer and an Al₂O₃ layer, when stored underhigh-temperature, high-humidity conditions for a long period of time.

[2] FIRST OPTICAL MEMBER

FIG. 2 shows an example of first optical members 11 comprising the firstanti-reflection coating 31 formed on a lens substrate 21. The lenssubstrate 21 has an effective diameter D and a radius R of curvature,whose ratio D/R is 0.1≤D/R≤2. As shown in FIG. 5, the effective diameterD is the maximum diameter of a lens effectively usable as an opticalmember, and the radius R of curvature is a radius of the curved lenssurface when it is approximated to a sphere. The use of a lens substratehaving a ratio D/R of 0.1-2 provides more effects of the presentinvention. Also, the use of a lens substrate having the maximuminclination angle of 30-65°, particularly 30-60°, provides more effectsof the present invention.

Each of the first and second layers 31 a, 31 b preferably has thicknessgradually decreasing as it goes from a center portion to a peripheralportion in the lens substrate 21. The first and second layers 31 a, 31 bare the same as the first and second layers 3 a, 3 b in the firstanti-reflection coating 3 except for the thickness variation.Specifically, the optical thickness D1(θ_(t)) of the first layer 31 aand the optical thickness D2(θ_(t)) of the second layer 31 b at anarbitrary inclination angle θ_(t) of the lens substrate 21 arepreferably expressed by the following formulae (1) and (2):D1(θ_(t))=D1₀×(cos θ_(t))^(α)  (1), andD2(θ_(t))=D2₀×(cos θ_(t))^(β)  (2),wherein D1 ₀ and D2 ₀ represent the optical thickness of the first andsecond layers 31 a, 31 b at a center of the lens substrate 21, and α andβ are numbers independently in a range of 0-1. α and β are morepreferably independently in a range of 0.5-0.95, most preferablyindependently in a range of 0.6-0.9.

With the first and second layers 31 a, 31 b getting thinner toward theperipheral portion, good anti-reflection is obtained regardless of thesubstrate inclination angle, providing an anti-reflection coating lessinfluenced by the incident angle of light beams. It is particularlyeffective, when a lens substrate having the maximum inclination angle of30° or more is used.

The optical thickness of the third layer 31 c is preferably constantregardless of the lens substrate inclination angle, or larger in aperipheral portion of the lens than at a center of the lens. Except forthis, the third layer 31 c is the same as the third layer 3 c in thefirst anti-reflection coating 3. The silica aerogel preferably has porediameters of 0.005-0.2 μm and porosity of 25-60%.

As shown in FIG. 3, the substrate inclination angle is an angle θ_(t) ofa normal line at an arbitrary point on the lens surface to a center axisC of the lens, which is 00 at a center of the lens, and larger at aposition nearer a periphery of the lens. The incident angle θ_(i) oflight beams at an arbitrary point on the lens surface is an angle of thelight beams to a normal line at the above point. The incident angleθ_(i) is shown at a center of the lens having a substrate inclinationangle of 0° in FIG. 4(a), and in a portion having a substrateinclination angle of θ_(t) in FIG. 4(b).

[3] PRODUCTION OF FIRST OPTICAL MEMBER

(1) FORMATION OF FIRST AND SECOND LAYERS

The first and second layers in the anti-reflection coating are formed bya dry process. The dry process may be, for example, a physical vapordeposition method such as a vacuum vapor deposition method, a sputteringmethod, an ion plating method, etc., or a chemical vapor depositionmethod such as thermal CVD, plasma CVD, photo CVD, etc. These methodsmay be combined, if necessary. The vacuum vapor deposition method isparticularly preferable from the aspect of production cost andprecision.

The vacuum vapor deposition method may use resistor heating, electronbeams, etc. The vacuum vapor deposition method using electron beams willbe explained below. As shown in FIG. 21, an electron-beam-type vacuumvapor deposition apparatus 130 comprises, in a vacuum chamber 131, arotary rack 132 for supporting pluralities of substrates 100 on itsinner surface, a vapor deposition source 133 comprising a crucible 136for a vapor deposition material 137, an electron beam ejector 138, aheater 139, and a pipe 135 connected to a vacuum pump 140. Thesubstrates 100 are placed on the rotary rack 132 with their surfacesopposing the vapor deposition source 133. The vapor deposition material137 is evaporated by heating by the irradiation of electron beams fromthe electron beam ejector 138. With the vacuum chamber 131 evacuated bythe vacuum pump 140, anti-reflection coatings are formed by accumulatinga vapor of the vapor deposition material 137 on the substrates 100. Toform uniform vapor deposited films, the rotary rack 132 is rotatedaround a rotary shaft 134 while heating the substrates 100 by the heater139.

When the lens substrates are vapor-deposited by the vacuum vapordeposition apparatus, the thickness of each layer from a center of thelens substrate to the peripheral portion can be controlled by adjustingthe positions of the lens substrates and the vapor deposition source133, the intensity of electron beams, the degree of vacuum, etc.

In the vacuum vapor deposition method, the initial degree of vacuum ispreferably 1.0×10⁻⁶ to 1.0×10⁻⁵ Torr. Outside the above range of thedegree of vacuum, vapor deposition takes too much time, resulting in lowproduction efficiency, or insufficient vapor deposition to complete thefilm formation. The temperature of the substrates 100 during vapordeposition can be properly determined depending on the heat resistanceof the substrates and the vapor deposition speed, though it ispreferably 60-250° C.

(2) FORMATION METHOD OF THIRD LAYER

The third layer in the anti-reflection coating is preferably formed by adry process, particularly a sol-gel method. The silica aerogel layerformed by a sol-gel method has an extremely lower refractive index thanthat of a MgF₂ layer (n=1.39), enabling an anti-reflection coatinghaving an extremely low reflectance in wide wavelength and incidentangle ranges, which would be difficult conventionally.

For example, when a MgF₂ layer is formed as the third layer on the lenssubstrate by vacuum vapor deposition, the third layer also has thicknessgradually decreasing toward a peripheral portion of the lens, like thefirst and second layers. Accordingly, all of the first to third layersare thinner in a peripheral portion of the lens having a largeinclination angle, failing to obtain good anti-reflection performance.

Though known sol-gel methods may be used, a preferable sol-gel methodfor forming the third silica aerogel layer comprises the steps of (i)preparing a first acidic sol having a median diameter of 100 nm or lessby mixing an alkaline sol, which is prepared by the hydrolysis andpolycondensation of alkoxysilane in the presence of a basic catalyst,with an acidic solution, (ii) preparing a second acidic sol having amedian diameter of 10 nm or less by the hydrolysis and polycondensationof alkoxysilane in the presence of an acidic catalyst, (iii) mixing thefirst and second acidic sols, (iv) applying the resultant mixed sol to alens substrate provided with the first and second layers, drying theresultant coating, (v) subjecting it to an alkali treatment, (vi)washing it, and (vii) subjecting it to a humid treatment.

(i) Preparation of First Acidic Sol

(a) Alkoxysilane

Alkoxysilane for the first acidic sol is preferably a monomer oroligomer (polycondensate) of tetraalkoxysilane. The use of afour-functional alkoxysilane enables the production of a sol ofcolloidal silica particles having relatively large particle sizes.Tetraalkoxysilane is preferably represented by Si(OR)₄, wherein R is analkyl group having 1-5 carbon atoms (methyl, ethyl, propyl, butyl,etc.), or an acyl group having 1-4 carbon atoms (acetyl, etc.). Specificexamples of tetraalkoxysilanes include tetramethoxysilane,tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane,diethoxydimethoxysilane, etc. Among them, tetramethoxysilane andtetraethoxysilane are preferable. Within a range not hindering theeffects of the present invention, a small amount ofthree-or-less-functional alkoxysilane may be added to tetraalkoxysilane.

(b) Hydrolysis and Polycondensation in Presence of Basic Catalyst

Hydrolysis and polycondensation proceed by adding an organic solvent, abasic catalyst and water to alkoxysilane. The organic solvent ispreferably alcohol such as methanol, ethanol, n-propanol, i-propanol,butanol, etc., more preferably methanol or ethanol. The basic catalystis preferably ammonia, amine, NaOH or KOH. The preferred amines arealcohol amines or alkyl amines (methylamine, dimethylamine,trimethylamine, n-butylamine, n-propylamine, etc.).

A ratio of the organic solvent to the alkoxysilane is preferably setsuch that the concentration of the alkoxysilane is 0.1-10% by mass asSiO₂ (silica concentration). When the concentration of silica is morethan 10% by mass, silica particles have too large particle sizes in theresultant sol. On the other hand, when the concentration of silica isless than 0.1, silica particles have too small particle sizes in theresultant sol. The organic solvent/alkoxysilane molar ratio ispreferably in a range of 1 to 10⁴.

The basic catalyst/alkoxysilane molar ratio is preferably 1×10⁻⁴ to 1,more preferably 1×10⁻⁴ to 0.8, particularly 3×10⁻⁴ to 0.5. With thebasic catalyst/alkoxysilane molar ratio of less than 1×10⁻⁴, asufficient hydrolysis reaction of alkoxysilane does not occur. On theother hand, when the molar ratio exceeds 1, a catalytic effect issaturated.

The water/alkoxysilane molar ratio is preferably 0.1-30. When thewater/alkoxysilane molar ratio is more than 30, a hydrolysis reactionproceeds too fast, making the control of the reaction difficult, makingit unlikely to form a uniform silica aerogel layer. On the other hand,when it is less than 0.1, sufficient hydrolysis of alkoxysilane does notoccur.

An alkoxysilane solution containing a basic catalyst and water ispreferably aged by leaving it to stand or slowly stirring at 10-90° C.for about 10-60 hours. By aging, hydrolysis and polycondensationproceed, forming a silica sol. The silica sol includes not only adispersion of colloidal silica particles, but also a dispersion ofcolloidal silica particles agglomerated in a cluster.

(c) Hydrolysis and Polycondensation in Presence of Acidic Catalyst

The resultant alkaline sol is mixed with an acidic catalyst, and ifnecessary, water and an organic solvent are added, so that hydrolysisand polycondensation further proceed in an acidic state. The acidiccatalyst includes hydrochloric acid, nitric acid, sulfuric acid,phosphoric acid, acetic acid, etc. The organic solvent used may be thesame as described above. In the first acidic sol, a molar ratio of theacidic catalyst to the basic catalyst is preferably 1.1-10, morepreferably 1.5-5, most preferably 2-4. When the molar ratio of theacidic catalyst to the basic catalyst is less than 1.1, sufficientpolymerization with the acidic catalyst does not proceed. On the otherhand, when it exceeds 10, a catalytic effect is saturated. The organicsolvent/alkoxysilane molar ratio and the water/alkoxysilane molar ratiomay be the same as described above. The sol containing the acidiccatalyst is preferably aged by leaving it to stand or slowly stirring at10-90° C. for about 15 minutes to 24 hours. By aging, hydrolysis andpolycondensation proceed, thereby forming the first acidic sol.

Silica particles in the first acidic sol have a median diameter of 100nm or less, preferably 10-50 nm. The median diameter is measured by adynamic light scattering method.

(ii) Preparation of Second Acidic Sol

(a) Alkoxysilane

Alkoxysilane for the second acidic sol may be a 2-to-4-functionalalkoxysilane represented by Si(OR¹)_(x)(R²)_(4-x), wherein x is aninteger of 2-4. R¹ is preferably an alkyl group having 1-5 carbon atoms(methyl, ethyl, propyl, butyl, etc.), or an acyl group having 1-4 carbonatoms (acetyl, etc.). R² is preferably an organic group having 1-10carbon atoms, for example, a hydrocarbon group such as methyl, ethyl,propyl, butyl, hexyl, cyclohexyl, octyl, decyl, phenyl, vinyl, allyl,etc., and a substituted hydrocarbon group such as γ-chloropropyl,CF₃CH₂—, CF₃CH₂CH₂—, C₂F₅CH₂CH₂—, C₃F₇CH₂CH₂CH₂—, CF₃OCH₂CH₂CH₂—,C₂F₅OCH₂CH₂CH₂—, C₃F₇OCH₂CH₂CH₂—, (CF₃)₂CHOCH₂CH₂CH₂—,C₄F₉CH₂OCH₂CH₂CH₂—, 3-(perfluorocyclohexyloxy)propyl,H(CF)₄CH₂OCH₂CH₂CH₂—, H(CF)₄CH₂CH₂CH₂—, γ-glycidoxypropyl,γ-mercaptopropyl, 3,4-epoxycyclohexylethyl, γ-methacryloyloxypropyl,etc.

Specific examples of two-functional alkoxysilanes includedimethyldialkoxysilanes such as dimethyldimethoxysilane,dimethyldiethoxysilane, etc. Specific examples of three-functionalalkoxysilanes include methyltrialkoxysilane such asmethyltrimethoxysilane, methyltriethoxysilane, etc., andphenyltrialkoxysilane such as phenyltriethoxysilane, etc. Specificexamples of four-functional alkoxysilanes include tetramethoxysilane,tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane,diethoxydimethoxysilane, etc. Alkoxysilane is preferablythree-functional or more, more preferably methyltrialkoxysilane ortetraalkoxysilane.

(b) Hydrolysis and Polycondensation in Presence of Acidic Catalyst

A monomer or oligomer (polycondensate) of alkoxysilane is mixed with anorganic solvent, an acidic catalyst and water, to cause the hydrolysisand polycondensation of alkoxysilane. The organic solvent and acidiccatalyst used may be the same as described in the step of preparing thefirst acidic sol. The acidic catalyst/alkoxysilane molar ratio ispreferably 1×10⁻⁴ to 1, more preferably 1×10⁻⁴ to 3×10⁻², mostpreferably 3×10⁻⁴ to 1×10⁻². The organic solvent/alkoxysilane molarratio and the water/alkoxysilane molar ratio may be the same asdescribed in the step of preparing the first acidic sol.

An alkoxysilane solution containing an acidic catalyst and water ispreferably aged by leaving it to stand or slowly stirring at 10-90° C.for about 30 minutes to 60 hours. By aging, hydrolysis andpolycondensation proceed, thereby forming the second acidic sol. Whenthe aging time exceeds 60 hours, the median diameter of silica particlesin the sol have becomes too large.

Colloidal silica particles in the second acidic sol have a smallermedian diameter than that of colloidal silica particles in the firstacidic sol. The median diameter of colloidal silica particles in thesecond acidic sol is 10 nm or less, preferably 1-5 nm. A median diameterratio of silica particles in the first acidic sol to those in the secondacidic sol is preferably 5-50, more preferably 5-35. With the mediandiameter ratio of less than 5 or more than 50, the resultant silicaaerogel layer has low scratch resistance.

(iii) Preparation of Mixed Sol

The first acidic sol is preferably mixed with the second acidic sol at1-30° C. for about 1 minute to 6 hours, while slowly stirring. Ifnecessary, the mixture may be heated at 80° C. or lower. A solidcomponent mass ratio of the first acidic sol to the second acidic sol ispreferably 5-90, more preferably 5-80. With the solid component massratio of less than 5 or more than 90, the resultant silica aerogel layerhas low scratch resistance.

(iv) Coating and Drying

(a) Coating

The mixed sol is coated to the lens substrate provided with the firstand second layers. The coating method includes a dip-coating method, aspray-coating method, a spin-coating method, a printing method, etc.When a three-dimensional structure like a lens is coated, a spin-coatingmethod or a dipping method is preferable, and a spin-coating method isparticularly preferable. The physical thickness of the resultant gel canbe controlled by adjusting the rotation speed of the substrate, theconcentration of the mixed sol, etc. in the spin-coating method. Therotation speed of the substrate in the spin-coating method is preferablyabout 1,000-15,000 rpm.

To adjust the concentration and flowability of the mixed sol for highercoatability, the above organic solvent may be added as a dispersant. Theconcentration of silica in the mixed sol is preferably 0.1-20% by mass.If necessary, the mixed sol may be subjected to an ultrasonic treatmentto prevent the agglomeration of colloid particles. The ultrasonic wavespreferably have a frequency of 10-30 kHz and a power of 300-900 W, andthe treatment time is preferably 5-120 minutes.

(b) Drying

The drying conditions of the coating are properly selected depending onthe heat resistance of the substrate. To accelerate the polycondensationreaction, the coating may be heat-treated at a temperature lower thanthe boiling point of water for 15 minutes to 24 hours, and then at atemperature of 100-200° C. for 15 minutes to 24 hours. The heat-treatedsilica aerogel layer exhibits high scratch resistance.

(v) Alkali Treatment

The silica aerogel layer is treated with an alkali to improve itsscratch resistance. The alkali treatment is preferably conducted byapplying an alkali solution to the silica aerogel layer, or by placingthe silica aerogel layer in an ammonia atmosphere. Solvents for thealkali solution can be properly selected depending on the type of thealkali, preferably water, alcohol, etc. The concentration of the alkalisolution is preferably 1×10⁻⁴ to 20 N, more preferably 1×10⁻³ to 15 N.

The alkalis may be inorganic alkalis such as sodium hydroxide, potassiumhydroxide, ammonia, etc.; inorganic alkali salts such as sodiumcarbonate, sodium hydrogen carbonate, ammonium carbonate, ammoniumhydrogen carbonate, etc.; organic alkalis such as monomethylamine,dimethylamine, trimethylamine, monoethylamine, diethylamine,triethylamine, n-propylamine, di-n-propylamine, n-butylamine,di-n-butylamine, n-amylamine, n-hexylamine, laurylamine,ethylenediamine, hexamethylenediamine, anilene, methylanilene,ethylanilene, cyclohexylamine, dicyclohexylamine, pyrrolidine, pyridine,imidazole, guanidine, tetramethylammonium hydroxide, tetraethylammoniumhydroxide, tetrabutylammonium hydroxide, monoethanolamine,diethanolamine, triethanolamine, choline, etc.; organic acid-alkalisalts such as ammonium formate, ammonium acetate, monomethylamineformate, dimethylamine acetate, anilene acetate, pyridine lactate,guanidinoacetate, etc.

10-200 ml of the alkali solution is preferably applied per 1 cm² of thesilica aerogel layer. The coating of the alkali solution can beconducted by the same method as coating the silica aerogel layer,preferably by a spin-coating method. The substrate is rotated preferablyat about 1,000-15,000 rpm in the spin-coating method. The layer coatedwith the alkali solution is left to stand preferably at 1-40° C., morepreferably at 10-30° C. The leaving time is preferably 0.1-10 hours,more preferably 0.2-1 hours.

In the case of the ammonia atmosphere, the silica aerogel layer ispreferably alkali-treated in an ammonia gas partial pressure of 1×10⁻¹to 1×10⁵ Pa. The treatment temperature is preferably 1-40° C., morepreferably 10-30° C. The treatment time is preferably 1-170 hours, morepreferably 5-80 hours.

If necessary, the alkali-treated silica aerogel layer is preferablydried at a temperature of 50-200° C. for 15 minutes to 24 hours.

(vi) Washing

The alkali-treated silica aerogel layer is washed, if necessary. Washingis preferably conducted by a method of immersing the alkali-treatedsilica aerogel layer in water and/or an alcohol, a method of showeringwater and/or an alcohol to the alkali-treated silica aerogel layer, ortheir combination. An ultrasonic treatment may be conducted duringimmersion. The washing temperature is preferably 1-40° C., and thewashing time is preferably 0.2-15 minutes. In washing, 0.01-1,000 ml ofwater and/or an alcohol is preferably used per 1 cm² of the silicaaerogel layer. The washed silica aerogel layer is preferably dried at atemperature of 50-200° C. for 15 minutes to 24 hours. The alcohol ispreferably methanol, ethanol or isopropyl alcohol.

(vii) Humid Treatment

The silica aerogel layer after coating, the alkali treatment or washingis subject to a humid treatment under high-humidity conditions. It ispresumed that the hydrolysis of unreacted alkoxysilane and thepolycondensation reaction of silanol groups occur by the humidtreatment, providing the silica aerogel layer with improved mechanicalstrength, while suppressing the variation of the refractive index of thelayer with time.

The humid treatment is conducted by placing the substrate having thesilica aerogel layer in an environment at a temperature of 35° C. orhigher and at relative humidity of 70% or more for 1 hour or more. Thehumidity of less than 70% RH would not provide sufficient treatmenteffects. The humidity is preferably 75% RH or more, more preferably 80%RH or more, most preferably 90% RH or more. The treatment temperature ispreferably 35-90° C., more preferably 40-80° C., most preferably 50-80°C. The treatment temperature of lower than 35° C. would not providesufficient effects, and the treatment temperature of higher than 90° C.would saturate the effects. To obtain the above the effects, thetreatment time is 1 hour or more, preferably 5-120 hours, morepreferably 5-48 hours, though variable depending on the temperature andhumidity conditions. With the treatment time of more than 120 hours, theabove effects would be saturated.

[4] SECOND AND THIRD ANTI-REFLECTION COATINGS

(1) LAYER STRUCTURE

FIG. 6 shows an optical member 4 having a four-layer structurecomprising a substrate 5, and an anti-reflection coating 6 comprisingfirst to fourth layers 6 a, 6 b, 6 c, 6 d formed in this order on thesubstrate 5. The anti-reflection coating 6 has two types of structuresdescribed below, on the substrate 5 having a refractive index of1.6-1.9.

(i) Second Anti-Reflection Coating

The second anti-reflection coating 6 comprises a first layer 6 a havinga refractive index of 1.37-1.57, a second layer 6 b having a refractiveindex of 1.75-2.5, a third layer 6 c having a refractive index of1.37-1.57, and a fourth layer 6 d having a refractive index of1.18-1.32. With the first to fourth layers having such refractiveindices, the second anti-reflection coating 6 formed on a substrate 5having a refractive index of 1.6-1.9 exhibits excellent anti-reflectionwithout using Al₂O₃ (refractive index: 1.64).

The first to third layers 6 a, 6 b, 6 c are layers containing no Al₂O₃,and the fourth layer 6 d is a silica aerogel layer. The first to thirdlayers 6 a, 6 b, 6 c are preferably formed by a dry process, and thefourth layer 6 d is preferably formed by a wet process. The wet processpreferably includes a sol-gel method.

The refractive index of the first layer is 1.37-1.57, preferably1.38-1.5, more preferably 1.38-1.48. The optical thickness of the firstlayer is preferably 8-100 nm, more preferably 10-85 nm. The refractiveindex of the second layer is 1.75-2.5, preferably 1.86-2.33, morepreferably 1.99-2.3. The optical thickness of the second layer ispreferably 8-60 nm, more preferably 10-50 nm. The refractive index ofthe third layer is 1.37-1.57, preferably 1.37-1.5, more preferably1.37-1.48. The optical thickness of the third layer is preferably 8-170nm, more preferably 10-160 nm.

Though materials forming the first and third layers may be the same ordifferent from each other, both of them are preferably made of SiO₂. Thefirst and third layers made of SiO₂ have improved adhesion. To improvethe anti-reflection performance, the second layer is preferably made ofTaO₂+Y₂O₃+Pr₆O₁₁.

The fourth layer is a silica aerogel layer, preferably formed by a wetprocess. The refractive index of the fourth layer is 1.18-1.32,preferably 1.2-1.32, more preferably 1.2-1.3. The optical thickness ofthe fourth layer is preferably 90-180 nm, more preferably 100-170 nm.With the outermost layer having such a low refractive index, excellentanti-reflection effects are obtained. The silica aerogel preferably haspore diameters of 0.005-0.2 μm and porosity of 25-60%.

(ii) Third Anti-Reflection Coating

The third anti-reflection coating 6 comprises a first layer 6 a having arefractive index of 1.75-2.5, a second layer 6 b having a refractiveindex of 1.37-1.57, a third layer 6 c having a refractive index of1.75-2.5, and a fourth layer 6 d having a refractive index of 1.18-1.32.With the first to fourth layers having such refractive indices, thethird anti-reflection coating 6 formed on the substrate 5 having arefractive index of 1.6-1.9 exhibits excellent anti-reflection withoutusing Al₂O₃ having a refractive index of 1.64.

The first to third layers 6 a, 6 b, 6 c are layers not containing Al₂O₃,and the fourth layer 6 d is a silica aerogel layer. The first to thirdlayers 6 a, 6 b, 6 c are preferably formed by a dry process, and thefourth layer 6 d is preferably formed by a wet process. The wet processpreferably includes a sol-gel method. Because the third anti-reflectioncoating 6 differs from the second anti-reflection coating 6 in the firstto third layers 6 a, 6 b, 6 c, only the first to third layers 6 a, 6 b,6 c will be explained below.

The refractive index of the first layer is 1.75-2.5, preferably1.86-2.33, more preferably 1.99-2.3. The optical thickness of the firstlayer is preferably 8-90 nm, more preferably 10-70 nm. The refractiveindex of the second layer is 1.37-1.57, preferably 1.37-1.5, morepreferably 1.37-1.48. The optical thickness of the second layer ispreferably 25-135 nm, more preferably 30-130 nm. The refractive index ofthe third layer is 1.75-2.5, preferably 1.86-2.33, more preferably1.99-2.3. The optical thickness of the third layer is preferably 8-80nm, more preferably 10-70 nm.

Though materials forming the first and third layers may be the same ordifferent from each other, both of them are preferably made ofTaO₂+Y₂O₃+Pr₆O₁₁. The first and third layers made of TaO₂+Y₂O₃+Pr₆O₁₁has improved adhesion. To have improved anti-reflection performance, thesecond layer is preferably made of MgF₂.

(2) SUBSTRATE

The second and third anti-reflection coatings can be formed on the samesubstrate as in the first anti-reflection coating.

[5] SECOND AND THIRD OPTICAL MEMBERS

FIG. 7 shows an optical member 41 comprising a lens substrate 51 havinga refractive index of 1.6-1.9, whose effective diameter D and radius Rof curvature meet the condition of 0.1≤D/R≤2, and an anti-reflectioncoating 61 comprising first to fourth layers 61 a, 61 b, 61 c, 61 dformed in this order on the lens substrate 51. The lens substrate 51 maybe the same as used in the first optical member, having the maximuminclination angle of 30-65°, particularly 30-60°. The anti-reflectioncoating 61 includes two types of the above-described second and thirdanti-reflection coatings. Because the anti-reflection coating 61 is thesame as the second and third anti-reflection coatings 6, and because thelens substrate 51 is the same as the lens substrate 21 in the firstoptical member, explanation will be made only on other portions.

In any of the second and third optical members, each of the first tothird layers 61 a, 61 b, 61 c preferably has thickness graduallydecreasing as it goes from a center portion to a peripheral portion inthe lens substrate 51, as shown in FIG. 7. With the first to thirdlayers 61 a, 61 b, 61 c getting thinner toward the periphery, theanti-reflection coating exhibits good anti-reflection regardless of theinclination angle of a substrate, which is less influenced by theincident angle of light beams. It is particularly effective, when a lenssubstrate, whose maximum inclination angle is 30° or more, is used.

The optical thickness D1(θ_(t)) of the first layer 61 a, the opticalthickness D2(θ_(t)) of the second layer 61 b and the optical thicknessD3(θ_(t)) of the third layer 61 c at an arbitrary inclination angleθ_(t) of the lens substrate 51 are preferably expressed by the followingformulae (1) to (3):D1(θ_(t))=D1₀×(cos θ_(t))^(α)  (1),D2(θ_(t))=D2₀×(cos θ_(t))^(β)  (2), andD3(θ_(t))=D3₀×(cos θ_(t))^(γ)  (3),wherein D1 ₀, D2 ₀ and D3 ₀ represent the optical thickness of the firstto third layers 61 a, 61 b, 61 c at a center of the lens substrate 51,and α, β and γ are numbers independently in a range of 0-1. α, β and γare more preferably independently in a range of 0.5-0.95, mostpreferably independently in a range of 0.6-0.9.

The second and third optical members each having an anti-reflectioncoating having a four-layer structure comprising an uppermost silicaaerogel layer exhibits excellent anti-reflection characteristics in wideranges of wavelength and incident angle without using an Al₂O₃ layer,with the refractive indices of the first to third layers adjusted, andis free from fogging which would occur in conventional anti-reflectioncoatings comprising a silica aerogel layer and an Al₂O₃ layer, whenstored under high-temperature, high-humidity conditions for a longperiod of time.

[6] PRODUCTION METHOD OF SECOND AND THIRD OPTICAL MEMBERS

The first to third layers in the second and third anti-reflectioncoatings can be produced by the same method as the first and secondlayers in the first anti-reflection coating. The fourth layer in thesecond and third anti-reflection coatings can be produced by the samemethod as the third layer in the first anti-reflection coating.

Because the above-described first to third optical members have themaximum reflectance of 6% or less in a visible light wavelength range of400-700 nm, they are suitable for lenses mounted in optical equipmentssuch as TV cameras, video cameras, digital cameras, vehicle cameras,microscopes, telescopes, etc., prisms, diffraction devices, etc.Particularly optical members having anti-reflection coatings on lenssubstrates having the maximum inclination angle of 300 or more aresuitable for ultra-wide-angle lenses, pickup lenses of optical disks,etc., because they have good anti-reflection characteristics even inperipheral portions.

To provide waterproofness and durability to the first to thirdanti-reflection coatings, silica aerogel having organically modifiedsilica end groups may be used for the uppermost layer. Also, awater-repellent, oil-repellent fluororesin coating may be formed on theuppermost layer of silica aerogel.

The present invention will be explained in further detail by Examplesbelow without intention of restricting the present invention thereto.

EXAMPLE 1

A first layer of MgF₂, a second layer of Ta₂O₅+Y₂O₃+Pr₆O₁₁, and a thirdlayer of silica aerogel were formed to the optical thickness shown inTable 1 on a flat glass plate of LaSF010 (refractive index: 1.839), toproduce each Sample a to g. Because each of the first and second layersformed on a lens substrate having a large maximum inclination anglebecomes gradually thinner as it goes from the center toward theperiphery (as the inclination angle becomes larger) as shown in FIG. 2,the thickness of the first and second layers in each Sample a to g wasset equal to the thickness at a lens substrate inclination angle of 0°,10°, 20°, 30°, 40°, 50° and 60°, respectively, and the thickness of thethird layer was set constant, to evaluate anti-reflection performance ateach inclination angle of the lens substrate.

TABLE 1 Layer Material Refractive Index Substrate LaSF010 1.839 FirstLayer MgF₂ 1.388 Second Layer Ta₂O₅ + Y₂O₃ + 2.055 Pr₆O₁₁ Third LayerSilica Aerogel 1.270 Optical Thickness [nm] Sample Sample Sample SampleSample Sample Sample Layer a b c d e f g Sub- — — — — — — — strate First41 40 39 37 34 30 25 Layer Second 34 34 33 31 29 25 21 Layer Third 150150 150 150 150 150 150 Layer Angle⁽¹⁾ 0 10 20 30 40 50 60 Note: ⁽¹⁾Acorresponding inclination angle (°) of the lens substrate.

The optical thickness D1(θ_(t)) of the first layer and the opticalthickness D2(θ_(t)) of the second layer at each inclination angle θ_(t)of the lens substrate, which are shown in Table 1, were determined bythe following formulae (1) and (2):D1(θ_(t))=D1₀×(cos θ_(t))^(α)  (1), andD2(θ_(t))=D2₀×(cos θ_(t))^(β)  (2),wherein D1 ₀ and D2 ₀ represent the optical thickness of the first andsecond layers at a substrate inclination angle of 0°, and both α and βare 0.7.

The production method of each Sample a to g was as follows.

(1) FORMATION OF FIRST AND SECOND LAYERS

Using the apparatus shown in FIG. 21, a first layer of MgF₂ and a secondlayer of Ta₂O₅+Y₂O₃+Pr₆O₁₁ were formed to the optical thickness shown inTable 1 on a flat glass plate of LaSF010, by a vacuum vapor depositionmethod with electron beams.

(2) FORMATION OF THIRD LAYER

(i) Preparation of First Acidic Sol

17.05 g of tetraethoxysilane was mixed with 69.13 g of methanol, and3.88 g of an aqueous ammonia solution (3 N) was add to the resultantmixture and stirred at room temperature for 15 hours to prepare analkaline sol. 40.01 g of this alkaline sol was mixed with 2.50 g ofmethanol and 1.71 g of hydrochloric acid (12 N), and stirred at roomtemperature for 30 minutes to prepare a first acidic sol (solidcomponent: 4.94% by mass).

(ii) Preparation of Second Acidic Sol

30 ml of tetraethoxysilane was mixed with 30 ml of ethanol at roomtemperature, and then with 2.4 ml of water. Thereafter, 0.1 ml ofhydrochloric acid (1 N) was added to the resultant mixture, and stirredat 60° C. for 90 minutes to prepare a second acidic sol (solidcomponent: 14.8% by mass).

(iii) Preparation of Mixed Sol

0.22 g of the second acidic sol was added to a total amount of the firstacidic sol, such that a solid component mass ratio of the first acidicsol to the second acidic sol was 67.1, and stirred at room temperaturefor 5 minutes to prepare a mixed sol.

(iv) Coating and Alkali Treatment

The mixed sol was applied to the second layer by a spin-coating method,dried at 80° C. for 0.5 hours, and then baked at 180° C. for 0.5 hours.The cooled coating was spin-coated with a 0.1-N aqueous sodium hydroxidesolution, and dried at 120° C. for 0.5 hours.

Using a lens reflectance meter (USPM-RU available from OlympusCorporation), the spectral reflectance of Sample a (corresponding to asubstrate inclination angle of 00) thus obtained was measured at eachlight beam incident angle of 0°, 10°, 20°, 30°, 40°, 50° and 60°. Theresults are shown in FIG. 8. Average reflectance in a wavelength rangeof 400-700 nm was calculated from the measured spectral reflectance ateach incident angle of light beams. With respect to Samples b to g(corresponding to substrate inclination angles of 100, 20°, 30°, 40°,50° and 60°, respectively), spectral reflectance was similarly measuredat each incident angle of light beams, and average reflectance in awavelength range of 400-700 nm was calculated at each incident angle oflight beams. The relation between the average reflectance at eachsubstrate inclination angle and the incident angle of light beams isshown in FIG. 9.

COMPARATIVE EXAMPLE 1

Anti-reflection coatings (Samples a to g) were produced in the samemanner as in Example 1, except for using Al₂O₃ and SiO₂ as materials forforming the first and second layers, and changing the optical thicknessof the first to third layers as shown in Table 2. The anti-reflectioncoatings of these samples correspond to conventional ones designed tohave a refractive index gradually decreasing from the first layer towardthe third layer.

TABLE 2 Layer Material Refractive Index Substrate LaSF010 1.839 FirstLayer Al₂O₃ 1.640 Second Layer SiO₂ 1.469 Third Layer Silica Aerogel1.250 Optical Thickness [nm] Sample Sample Sample Sample Sample SampleSample Layer a b c d e f g Sub- — — — — — — — strate First 114 113 109103 95 84 70 Layer Second 25 25 24 23 21 18 15 Layer Third 126 126 126126 126 126 126 Layer Angle⁽¹⁾ 0 10 20 30 40 50 60 Note: ⁽¹⁾Acorresponding inclination angle (°) of the lens substrate.

The spectral reflectance of Sample a (corresponding to a substrateinclination angle of 0°) thus obtained was measured at each light beamincident angle of 0°, 10°, 20°, 30°, 40°, 50° and 60° in the same manneras in Example 1. The results are shown in FIG. 10. As in Example 1, therelation between the average reflectance at each substrate inclinationangle and the incident angle of light beams is shown in FIG. 11.

COMPARATIVE EXAMPLE 2

As shown in Table 3, an optical member comprising a seven-layeranti-reflection coating was produced.

(1) FORMATION OF FIRST TO SIXTH LAYERS

Using the apparatus shown in FIG. 21, first to sixth layers were formedin this order on a flat glass plate of LaSF010 (refractive index: 1.839)by a vacuum vapor deposition method with electron beams, as shown inTable 3. The vapor deposition was conducted at an initial degree ofvacuum of 1.2×10⁻⁵ Torr and a substrate temperature of 230° C.

(2) FORMATION OF SEVENTH LAYER

The seventh layer of silica aerogel layer was formed in the same manneras in the third layer of Example 1, except for changing the opticalthickness as shown in Table 3.

TABLE 3 Layer Material Refractive Index Substrate LaSF010 1.839 FirstLayer Al₂O₃ 1.640 Second Layer Ta₂O₅ + Pr₆O₁₁ + 2.055 Y₂O₃ Third LayerMgF₂ 1.388 Fourth Layer Ta₂O₅ + Pr₆O₁₁ + 2.055 Y₂O₃ Fifth Layer MgF₂1.388 Sixth Layer Ta₂O₅ + Pr₆O₁₁ + 2.055 Y₂O₃ Seventh Layer SilicaAerogel 1.250 Optical Thickness [nm] Sample Sample Sample Sample SampleSample Sample Layer a b c d e f g Sub- — — — — — — — strate First 45 4543 41 38 33 28 Layer Second 61 60 58 61 51 45 38 Layer Third 25 25 24 2321 18 15 Layer Fourth 262 259 251 237 218 192 161 Layer Fifth 34 34 3331 28 25 21 Layer Sixth 37 37 36 34 31 28 23 Layer Seventh 135 135 135135 135 135 135 Layer Angle⁽¹⁾ 0 10 20 30 40 50 60 Note: ⁽¹⁾Acorresponding inclination angle (°) of the lens substrate.

The spectral reflectance of Sample a (corresponding to a substrateinclination angle of 0°) thus obtained was measured at each light beamincident angle of 0°, 10°, 20°, 30°, 40°, 50° and 60° in the same manneras in Example 1. The results are shown in FIG. 12. As in Example 1, therelation between the average reflectance at each substrate inclinationangle and the incident angle of light beams is shown in FIG. 13.

As is clear from FIGS. 12 and 13, the samples of Comparative Example 2exhibited much poorer anti-reflection performance than those of Example1 in portions with large inclination angles (40-60°), despite as many as7 layers.

COMPARATIVE EXAMPLE 3

Optical members were produced in the same manner as in ComparativeExample 2, except for changing the uppermost layer (seventh layer) ofthe anti-reflection coating from the silica aerogel layer to a MgF₂layer formed by a vacuum vapor deposition method. Like other layers, thethickness of the seventh layer decreased gradually in the order ofSamples a to g.

Using the apparatus shown in FIG. 21, first to seventh layers wereformed in this order on a flat glass plate of LaSF010 (refractive index:1.839) by a vacuum vapor deposition method with electron beams, as shownin Table 4. The vapor deposition was conducted at an initial degree ofvacuum of 1.2×10⁻⁵ Torr and a substrate temperature of 230° C.

TABLE 4 Layer Material Refractive Index Substrate LaSF010 1.839 FirstLayer Al₂O₃ 1.640 Second Layer Ta₂O₅ + Pr₆O₁₁ + 2.055 Y₂O₃ Third LayerMgF₂ 1.388 Fourth Layer Ta₂O₅ + Pr₆O₁₁ + 2.055 Y₂O₃ Fifth Layer MgF₂1.388 Sixth Layer Ta₂O₅ + Pr₆O₁₁ + 2.055 Y₂O₃ Seventh Layer MgF₂ 1.388Optical Thickness [nm] Sample Sample Sample Sample Sample Sample SampleLayer a b c d e f g Sub- — — — — — — — strate First 33 33 32 30 28 24 20Layer Second 64 64 62 64 54 47 40 Layer Third 25 25 24 23 21 18 15 LayerFourth 283 280 271 256 235 208 174 Layer Fifth 25 25 24 23 21 18 15Layer Sixth 25 25 24 23 21 18 15 Layer Seventh 116 114 111 105 96 85 71Layer Angle⁽¹⁾ 0 10 20 30 40 50 60 Note: ⁽¹⁾A corresponding inclinationangle (°) of the lens substrate.

The spectral reflectance of Sample a (corresponding to a substrateinclination angle of 0°) thus obtained was measured at each light beamincident angle of 0°, 10°, 20°, 30°, 40°, 50° and 60° in the same manneras in Example 1. The results are shown in FIG. 14. As in Example 1, therelation between the average reflectance at each substrate inclinationangle and the incident angle of light beams is shown in FIG. 15.

As is clear from FIGS. 14 and 15, the samples of Comparative Example 3,which had the outermost layers becoming thinner as the substrateinclination angle increased, exhibited extremely poor anti-reflectionperformance in portions with large substrate inclination angles(30-60°).

EXAMPLE 2

A first layer of SiO₂ (refractive index: 1.469), a second layer ofTa₂O₅+Y₂O₃+Pr₆O₁₁ (refractive index: 2.055), a third layer of SiO₂(refractive index: 1.469) and a fourth layer of silica aerogel(refractive index: 1.250) were formed to each optical thickness shown inTable 5 on a flat glass plate of LaSF010 (refractive index: 1.839) bythe same method as in Example 1, to produce Samples a to g To evaluatethe anti-reflection performance of an anti-reflection coating on a lenssubstrate having a large maximum inclination angle as shown in FIG. 7 ateach substrate inclination angle, each of Samples a to g comprised firstto fourth layers formed on a flat glass plate at thickness correspondingto the thickness of each layer at a lens substrate inclination angle of0°, 10°, 20°, 30°, 40°, 50° and 60°, the first to third layers becominggradually thinner from Sample a to Sample g, and the fourth layer havinga constant thickness.

TABLE 5 Layer Material Refractive Index Substrate LaSF010 1.839 FirstLayer SiO₂ 1.640 Second Layer Ta₂O₅ + Y₂O₃ + 2.055 Pr₆O₁₁ Third LayerSiO₂ 1.469 Fourth Layer Silica Aerogel 1.250 Optical Thickness [nm]Sample Sample Sample Sample Sample Sample Sample Layer a b c d e f gSub- — — — — — — — strate First 38 37 36 34 31 28 23 Layer Second 24 2423 22 20 18 15 Layer Third 68 67 65 61 56 50 42 Layer Fourth 116 116 116116 116 116 116 Layer Angle⁽¹⁾ 0 10 20 30 40 50 60 Note: ⁽¹⁾Acorresponding inclination angle (°) of the lens substrate.

The optical thickness D1(θ_(t)) of the first layer, the opticalthickness D2(θ_(t)) of the second layer and the optical thicknessD3(θ_(t)) of the third layer at each substrate inclination angle(θ_(t)), which are shown in Table 5, were determined by the followingformulae (1) to (3):D1(θ_(t))=D1₀×(cos θ_(t))^(α)  (1),D2(θ_(t))=D2₀×(cos θ_(t))^(β)  (2), andD3(θ_(t))=D3₀×(cos θ_(t))^(γ)  (3),wherein D1 ₀, D2 ₀ and D3 ₀ represent the optical thickness of the firstto third layers at a substrate inclination angle of 0°, and all of α, βand γ are 0.7.

The spectral reflectance of Sample a (corresponding to a substrateinclination angle of 0°) thus obtained was measured at each light beamincident angle of 0°, 10°, 20°, 30°, 40°, 50° and 60° in the same manneras in Example 1. The results are shown in FIG. 16. Average reflectancein a wavelength range of 400-700 nm was calculated from the measuredspectral reflectance at each incident angle of light beams. With respectto Samples b to g (corresponding to substrate inclination angles of 10°,20°, 30°, 40°, 50° and 60°, respectively), spectral reflectance at eachincident angle of light beams was similarly measured, and averagereflectance in a wavelength range of 400-700 nm was calculated at eachincident angle of light beams. The relation between the averagereflectance at each substrate inclination angle and the incident angleof light beams is shown in FIG. 17.

ACCELERATED ENVIRONMENTAL TESTING

Each of Samples a, d and f (having substrate inclination angles of 0°,30° and 50°, respectively) of Example 1, Comparative Example 1 andExample 2 was stored at 60° C. and 90% RH for 48 hours for acceleratedenvironmental testing Their spectral reflection characteristics measuredby the same method as described above after the acceleratedenvironmental testing were compared with those before the testing. Theresults are shown in FIG. 18 (Example 1), FIG. 19 (ComparativeExample 1) and FIG. 20 (Example 2).

As is clear from FIGS. 18-20, the samples of Comparative Example 1exhibited poor spectral reflection characteristics after the acceleratedenvironmental testing under the high-temperature, high-humidityconditions, while the spectral reflection characteristics of the samplesof Examples 1 and 2 were not substantially deteriorated, indicating thattheir anti-reflection characteristics at high temperatures and humiditywere highly durable.

EFFECT OF THE INVENTION

Because the anti-reflection coating of the present invention hasexcellent storage stability, particularly exhibiting stableanti-reflection performance even when stored under high-temperature,high-humidity conditions for a long period of time, it is suitable forimaging equipments such as exchange lenses for single-lens reflexcameras, etc. Further, the anti-reflection coating of the presentinvention can be produced at a high yield, because of excellentproduction stability.

Because the optical member of the present invention exhibits excellentanti-reflection performance in a wide wavelength range even on a lenssubstrate having a maximum inclination angle of 30° or more, it isparticularly suitable for ultrawide-angle lenses, lenses having smallradii of curvature to effective diameters, pickup lenses of opticaldisks, etc.

What is claimed is:
 1. An anti-reflection coating having: a three-layerstructure comprising first to third layers formed in this order on asubstrate; said substrate having a refractive index of 1.6-1.9, saidfirst layer having a refractive index of 1.37-1.5, said second layerhaving a refractive index of 1.75-2.5, and said third layer having arefractive index of 1.18-1.32, to light in a wavelength range of 550 nm;said third layer being made of silica aerogel formed by a sol-gelmethod; said second layer being made of TaO₂+Y₂O₃ +Pr₆O₁₁ or Ta₂O₅ +Y₂O₃+Pr₆O₁₁; and said first and second layers containing no Al₂O₃.
 2. Theanti-reflection coating according to claim 1; wherein said first andsecond layers are formed by a dry process.
 3. An optical membercomprising: the anti-reflection coating recited in claim 1 on a lenssubstrate, whose effective diameter D and radius R of curvature meet thecondition of 0.1 <D/R <2.
 4. The optical member according to claim 3;wherein said first and second layers are formed by a dry process.
 5. Theoptical member according to claim 3; wherein said lens substrate has themaximum inclination angle of 30-65° .
 6. The optical member according toclaim 3; wherein an optical thickness D1(θ_(t)) of the first layer andan optical thickness of the second layer D2(θ_(t)) at an arbitraryinclination angle θ_(t) of said lens substrate are respectivelyexpressed by the following formulae (1) and (2):D1(θ_(t))=D1₀×(cos θ_(t))^(α)  (1), andD2(θ_(t))=D2₀×(cos θ_(t))^(β)  (2), wherein: D1 ₀ and D2 ₀ representoptical thicknesses of said first and second layers at a center of saidlens substrate; and α and β are numbers independently in a range of 0-1.7. The optical member according to claim 3; wherein a thickness of saidthird layer is constant regardless of the inclination angle of said lenssubstrate, or larger in a peripheral portion of the lens substrate thanat a center of the lens substrate.